| Main centres: | 1-3 business days |
| Regional areas: | 3-4 business days |
| Remote areas: | 3-5 business days |
1. GENERAL DESCRIPTION
Liquid photo-positive resist based on o-naphto-chinon-diazide and Novolack, used in the
production of printed circuit boards.
2. FEATURES
POSITIV 20 is a classic liquid photo-resist that transfers patterns directly onto working
materials for processing by etching. The lacquer resists strong acidic etching products
however can be easily be removed by solvents (ester, ketone) or aqueous alkalines.
The lacquer is at its most photo-sensitive at close utlra-violet range (UVA). The lacquer
should therefore be applied in yellow light or darkened daylight.
3. APPLICATIONS
The main application for POSITIV 20 is the production of printed circuits boards. The
transparent positive-pattern from the circuit diagram is accurately transferred. Surfaces
impervious to light e.g. the electrical circuits, do remain present after etching.
Other application include photo-lithographics on metal or glass.
